X-ray thin film inspection apparatus and thin film inspection apparatus and method for patterned wafer

An X-ray thin film inspection apparatus including a sample table on which an inspection target such as a product wafer or the like is mounted, a positioning mechanism for moving the sample table, a goniometer having first and second swing arms, at least one X-ray irradiation unit that are mounted on...

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Bibliographische Detailangaben
Hauptverfasser: KIKU ATSUNORI, NAKANO ASAO, MOTONO HIROSHI, KINEFUCHI TAKAO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An X-ray thin film inspection apparatus including a sample table on which an inspection target such as a product wafer or the like is mounted, a positioning mechanism for moving the sample table, a goniometer having first and second swing arms, at least one X-ray irradiation unit that are mounted on the first swing arm and containing an X-ray tube and an X-ray optical element in a shield tube, an X-ray detector mounted on a second swing arm, and an optical camera for subjecting the inspection target disposed on the sample table to pattern recognition.