Peelable circuit board foil

In one embodiment, a peelable circuit board foil ( 200 ) has a metal support layer ( 205 ) and a conductive metal foil layer ( 210 ) bonded by an inorganic high temperature release structure ( 215 ) that comprises a co-deposited layer ( 250 ) and a metal oxide layer ( 260 ). The co-deposited layer c...

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Hauptverfasser: DEAN TIMOTHY B, CHELINI REMY J, DUNN GREGORY J
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Sprache:eng
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creator DEAN TIMOTHY B
CHELINI REMY J
DUNN GREGORY J
description In one embodiment, a peelable circuit board foil ( 200 ) has a metal support layer ( 205 ) and a conductive metal foil layer ( 210 ) bonded by an inorganic high temperature release structure ( 215 ) that comprises a co-deposited layer ( 250 ) and a metal oxide layer ( 260 ). The co-deposited layer comprises an admixture of nickel and one or more of boron, phosphorus, and chromium. In a second embodiment, the peelable printed circuit foil ( 200 ) has a crystallized dielectric oxide layer ( 405 ) disposed on the metal foil layer and an electrode layer ( 415 ) disposed on the crystallized dielectric oxide layer, forming a dielectric peelable circuit board foil ( 400 ) that may be adhered to a layer of a flexible or rigid circuit board, after which the metal support layer can be peeled away, leaving a capacitive structure including the metal foil layer, the crystallized dielectric oxide layer, and the electrode layer.
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The co-deposited layer comprises an admixture of nickel and one or more of boron, phosphorus, and chromium. In a second embodiment, the peelable printed circuit foil ( 200 ) has a crystallized dielectric oxide layer ( 405 ) disposed on the metal foil layer and an electrode layer ( 415 ) disposed on the crystallized dielectric oxide layer, forming a dielectric peelable circuit board foil ( 400 ) that may be adhered to a layer of a flexible or rigid circuit board, after which the metal support layer can be peeled away, leaving a capacitive structure including the metal foil layer, the crystallized dielectric oxide layer, and the electrode layer.</description><language>eng</language><subject>LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; PERFORMING OPERATIONS ; TRANSPORTING</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070710&amp;DB=EPODOC&amp;CC=US&amp;NR=7241510B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070710&amp;DB=EPODOC&amp;CC=US&amp;NR=7241510B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DEAN TIMOTHY B</creatorcontrib><creatorcontrib>CHELINI REMY J</creatorcontrib><creatorcontrib>DUNN GREGORY J</creatorcontrib><title>Peelable circuit board foil</title><description>In one embodiment, a peelable circuit board foil ( 200 ) has a metal support layer ( 205 ) and a conductive metal foil layer ( 210 ) bonded by an inorganic high temperature release structure ( 215 ) that comprises a co-deposited layer ( 250 ) and a metal oxide layer ( 260 ). The co-deposited layer comprises an admixture of nickel and one or more of boron, phosphorus, and chromium. 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subjects LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
PERFORMING OPERATIONS
TRANSPORTING
title Peelable circuit board foil
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