Substrate support having heat transfer system

A support for a substrate processing chamber has upper and lower walls that are joined by a peripheral sidewall to define a reservoir. A fluid inlet supplies a heat transfer fluid to the reservoir. In one version, a plurality of protrusions extends into the reservoir to perturb the flow of the heat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LUE BRIAN C, WONG KWOK MANUS, HOFFMAN DANIEL J, YE YAN, KATS SEMYON L, ISHIKAWA TETSUYA, CHENG WING LAU, HANAWA HIROJI, RAMASWAMY KARTIK, NGUYEN ANDREW
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY NATURALLY-OCCURRING ELECTRICITY SEMICONDUCTOR DEVICES STATIC ELECTRICITY
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Beschreibung
Zusammenfassung:	A support for a substrate processing chamber has upper and lower walls that are joined by a peripheral sidewall to define a reservoir. A fluid inlet supplies a heat transfer fluid to the reservoir. In one version, a plurality of protrusions extends into the reservoir to perturb the flow of the heat transfer fluid through the reservoir. In another version, the reservoir is an elongated channel having one or more of (i) serpentine convolutions, (ii) integral fins extending into the channel, (iii) a roughened internal surface, or (iv) a changing cross-section. A fluid outlet discharges the heat transfer fluid from the reservoir.