Exposure assembly for exposing a double-sided printed circuit panel to light

An exposure assembly and an exposure installation for exposing a double-sided printed circuit panel to light through a first and a second artwork, including at least one exposure assembly having a frame, a first and a second artwork support, means for moving closer/separating for the artwork support...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	COUSIN CHRISTOPHE, GOUT GREGOIRE
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	An exposure assembly and an exposure installation for exposing a double-sided printed circuit panel to light through a first and a second artwork, including at least one exposure assembly having a frame, a first and a second artwork support, means for moving closer/separating for the artwork supports, and means for holding the printed circuit panel. The installation furthermore includes an optical detection device for detecting position errors, a light source, and an optical device for directing a light beam emitted by said light source. The exposure assembly furthermore has a common displacement device making it possible to jointly displace the artwork supports, and a separate displacement device making it possible to displace the second artwork support with respect to the first artwork support.