System and method for determining S-parameters of a connected structure

One disclosed embodiment may include a method that includes providing a first set S-parameters for a path of a first substrate having a first port and a second port and providing a second set of S-parameters for a path of a second substrate having a first port and a second port. Waveform parameters...

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Bibliographische Detailangaben
Hauptverfasser:	BOIS KARL JOSEPH, WANG YONG, QUINT DAVID W
Format:	Patent
Sprache:	eng
Schlagworte:	MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	One disclosed embodiment may include a method that includes providing a first set S-parameters for a path of a first substrate having a first port and a second port and providing a second set of S-parameters for a path of a second substrate having a first port and a second port. Waveform parameters are measured for an aggregate path that includes the path of the first substrate, the path of the second substrate, and a structure interconnecting the first and second substrates to provide a third set of S-parameters. A fourth set of S-parameters is calculated for the structure interconnecting the first and second substrates based on the first, second, and third sets of S-parameters.