Chemically assisted mechanical cleaning of MRAM structures

A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the substrate. A non-HF, copper compatible chemistry is introduced...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RAVKIN MICHAEL, MIKHAYLICHENKO KATRINA
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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