Chemically assisted mechanical cleaning of MRAM structures

Chemically assisted mechanical cleaning of MRAM structures

A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the substrate. A non-HF, copper compatible chemistry is introduced...

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Hauptverfasser: RAVKIN MICHAEL, MIKHAYLICHENKO KATRINA
Format: Patent
Sprache:eng
Schlagworte:
CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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creator RAVKIN MICHAEL
MIKHAYLICHENKO KATRINA
description A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the substrate. A non-HF, copper compatible chemistry is introduced into the first brush box for cleaning the active and backside surfaces of the substrate. The substrate is then inserted into a second brush box which is also configured to provide double-sided mechanical cleaning of the active and backside surfaces of the substrate. A burst of chemistry is introduced into the second brush box followed by a DIW rinse. The substrate is then processed through an SRD apparatus for final rinse and dry.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US7067016B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US7067016B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US7067016B13</originalsourceid><addsrcrecordid>eNrjZLByzkjNzUxOzMmpVEgsLs4sLklNUchNTc5IzAOJKiTnpAJZeekK-WkKvkGOvgrFJUWlySWlRanFPAysaYk5xam8UJqbQcHNNcTZQze1ID8-tbggMTk1L7UkPjTY3MDM3MDQzMnQmAglABbkLq4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Chemically assisted mechanical cleaning of MRAM structures</title><source>esp@cenet</source><creator>RAVKIN MICHAEL ; MIKHAYLICHENKO KATRINA</creator><creatorcontrib>RAVKIN MICHAEL ; MIKHAYLICHENKO KATRINA</creatorcontrib><description>A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the substrate. A non-HF, copper compatible chemistry is introduced into the first brush box for cleaning the active and backside surfaces of the substrate. The substrate is then inserted into a second brush box which is also configured to provide double-sided mechanical cleaning of the active and backside surfaces of the substrate. A burst of chemistry is introduced into the second brush box followed by a DIW rinse. The substrate is then processed through an SRD apparatus for final rinse and dry.</description><language>eng</language><subject>CLEANING ; CLEANING IN GENERAL ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; TRANSPORTING</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060627&amp;DB=EPODOC&amp;CC=US&amp;NR=7067016B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060627&amp;DB=EPODOC&amp;CC=US&amp;NR=7067016B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RAVKIN MICHAEL</creatorcontrib><creatorcontrib>MIKHAYLICHENKO KATRINA</creatorcontrib><title>Chemically assisted mechanical cleaning of MRAM structures</title><description>A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the substrate. A non-HF, copper compatible chemistry is introduced into the first brush box for cleaning the active and backside surfaces of the substrate. The substrate is then inserted into a second brush box which is also configured to provide double-sided mechanical cleaning of the active and backside surfaces of the substrate. A burst of chemistry is introduced into the second brush box followed by a DIW rinse. The substrate is then processed through an SRD apparatus for final rinse and dry.</description><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLByzkjNzUxOzMmpVEgsLs4sLklNUchNTc5IzAOJKiTnpAJZeekK-WkKvkGOvgrFJUWlySWlRanFPAysaYk5xam8UJqbQcHNNcTZQze1ID8-tbggMTk1L7UkPjTY3MDM3MDQzMnQmAglABbkLq4</recordid><startdate>20060627</startdate><enddate>20060627</enddate><creator>RAVKIN MICHAEL</creator><creator>MIKHAYLICHENKO KATRINA</creator><scope>EVB</scope></search><sort><creationdate>20060627</creationdate><title>Chemically assisted mechanical cleaning of MRAM structures</title><author>RAVKIN MICHAEL ; MIKHAYLICHENKO KATRINA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US7067016B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>RAVKIN MICHAEL</creatorcontrib><creatorcontrib>MIKHAYLICHENKO KATRINA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RAVKIN MICHAEL</au><au>MIKHAYLICHENKO KATRINA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Chemically assisted mechanical cleaning of MRAM structures</title><date>2006-06-27</date><risdate>2006</risdate><abstract>A method for post-etch cleaning of a substrate with MRAM structures and MJT structures and materials is disclosed. The method includes inserting the substrate into a first brush box configured for double-sided mechanical cleaning of the substrate. A non-HF, copper compatible chemistry is introduced into the first brush box for cleaning the active and backside surfaces of the substrate. The substrate is then inserted into a second brush box which is also configured to provide double-sided mechanical cleaning of the active and backside surfaces of the substrate. A burst of chemistry is introduced into the second brush box followed by a DIW rinse. The substrate is then processed through an SRD apparatus for final rinse and dry.</abstract><oa>free_for_read</oa></addata></record>
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subjects CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
title Chemically assisted mechanical cleaning of MRAM structures
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-15T17%3A54%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RAVKIN%20MICHAEL&rft.date=2006-06-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS7067016B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true