Lithographic apparatus, device manufacturing method, and device manufactured thereby

A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a res...

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Bibliographische Detailangaben
Hauptverfasser:	ROSSING HARM ROELOF, VAN DEN BRINK MARINUS AART, GEORGE RICHARD ALEXANDER
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic projection apparatus having at least two substrate holders is controlled to reduce effects of differences in images caused by differences between the two substrate holders. The apparatus includes an internal or external detector that identifies a substrate and associates it with a respective one of the substrate holders. A controller ensures that either the substrate is processed on the appropriate holder or that correction is applied to the imaging. In an alternate embodiment, the substrate is associated with a respective one of the substrate holders and is consistently processed using that substrate holder without further identification steps.