Modeling process for integrated circuit film resistors

A method is presented, in which a thin film resistor is modeled to account for self-heating. The method includes fabricating the thin film resistor and characterizing a thermal resistance of the thin film resistor, wherein the thermal resistance accounts for self-heating thereof during operation. Th...

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Bibliographische Detailangaben
Hauptverfasser: WEISER DOUG, CHATTERJEE AMITAVA, STEINMANN PHILIPP, BUCKSCH ROLAND
Format: Patent
Sprache:eng
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Zusammenfassung:A method is presented, in which a thin film resistor is modeled to account for self-heating. The method includes fabricating the thin film resistor and characterizing a thermal resistance of the thin film resistor, wherein the thermal resistance accounts for self-heating thereof during operation. The thermal resistance is then used in a model for simulating integrated circuits using the thin film resistor.