Method and device for evaluating charge potential

In a charge potential evaluation device, the measured value of a potential difference Vc in a charged plate monitor (CPM) is converted into a potential difference Vh between the conductive pattern and load beam in a head gimbal assembly (HGA), using the following expression (1), V h = d h ɛ h . ɛ c...

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Bibliographische Detailangaben
1. Verfasser:	KAWATA SADAO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CORONA DEVICES ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES NATURALLY-OCCURRING ELECTRICITY OVERVOLTAGE ARRESTERS USING SPARK GAPS PHYSICS SPARK GAPS SPARKING PLUGS STATIC ELECTRICITY TESTING
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Beschreibung
Zusammenfassung:	In a charge potential evaluation device, the measured value of a potential difference Vc in a charged plate monitor (CPM) is converted into a potential difference Vh between the conductive pattern and load beam in a head gimbal assembly (HGA), using the following expression (1), V h = d h ɛ h . ɛ c d c ⁢ V c [ Expression ⁢ ⁢ 1 ] where dh denotes the distance between the conductive pattern and the load beam in the HGA, dc denotes the distance between the conductive plate and a grounded surface in the CPM, epsilonh denotes the relative permittivity of an insulating foundation layer in the HGA, and epsilonc denotes the relative permittivity of the region between the conductive plate and the grounded surface in the CPM.