Hybrid gap measurement circuit

Systems and methods are disclosed for measuring a distance (or gap) between substrates of a hybrid semiconductor. The measurements may be made during a hybridization process to, for example, provide alignment feedback during the hybridization process. The measurements may also be made after the hybr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: COSTELLO ADRIENNE N, PARRISH WILLIAM J, AZIZ NASEEM Y, BARTON JEFFREY B
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Systems and methods are disclosed for measuring a distance (or gap) between substrates of a hybrid semiconductor. The measurements may be made during a hybridization process to, for example, provide alignment feedback during the hybridization process. The measurements may also be made after the hybridization process to further calibrate the process or to provide information useful for further processing operations.