Standoff/mask structure for electrical interconnect

A multi-layer standoff/mask structure including a standoff having a plurality of standoff openings and a mask having a plurality of mask openings aligned with the standoff openings.

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Bibliographische Detailangaben
Hauptverfasser: SLENES CHAD, SCHMACHTENBERG, III RICHARD, ANDREWS JOHN R, GERNER BRADLEY J, SCHULTZ SAMUEL V
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A multi-layer standoff/mask structure including a standoff having a plurality of standoff openings and a mask having a plurality of mask openings aligned with the standoff openings.