Electron beam apparatus using electron source, image-forming apparatus using the same and method of manufacturing members to be used in such electron beam apparatus
This invention provides an arrangement for alleviating the electric charge of members apt to be electrically charged such as spacers used in an electron beam apparatus by arranging a high resistance film thereon. Particularly, the low resistance layer arranged at each of the members is covered by a...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | This invention provides an arrangement for alleviating the electric charge of members apt to be electrically charged such as spacers used in an electron beam apparatus by arranging a high resistance film thereon. Particularly, the low resistance layer arranged at each of the members is covered by a high resistance film to suppress any electric discharges. |
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