Stress-relief layer for semiconductor applications

In a semiconductor integrated circuit device, thermo-mechanical stresses on the vias can be reduced by introducing a stress relief layer between the vias and a hard dielectric layer that overlies the vias.

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Bibliographische Detailangaben
Hauptverfasser: KALTALIOGLU ERDEM, HOINKIS MARK D, LEUNG PAK, BARTH HANS-JOACHIM, FRIESE GERALD R
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:In a semiconductor integrated circuit device, thermo-mechanical stresses on the vias can be reduced by introducing a stress relief layer between the vias and a hard dielectric layer that overlies the vias.