Method for finding a pattern which may fall partially outside an image

A method is provided for finding a whole pattern in an image, where at least a portion of the whole pattern falls outside the boundary of the image. The method includes, for each candidate pose of a search model of the whole pattern that results in a transformed search model that may extend beyond t...

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1. Verfasser: WAGMAN ADAM
Format: Patent
Sprache:eng
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Zusammenfassung:A method is provided for finding a whole pattern in an image, where at least a portion of the whole pattern falls outside the boundary of the image. The method includes, for each candidate pose of a search model of the whole pattern that results in a transformed search model that may extend beyond the boundary of the image, applying a match-quality metric to only a subset of search model features and corresponding image features, the subset being uniquely determined by the pose. The features which do not overlap the image at that pose of the model are completely excluded from the metric computation. All the relevant available information is used, using no arbitrarily hypothesized information. The higher-level strategy of the search procedure is free to consider poses where the model extends partially outside the image, and the results of each metric computation will be the most true value possible.