Exposure apparatus and exposure method capable of controlling illumination distribution

An exposure apparatus which expose a photosensitive layer on an object with light via a mask having a pattern to be transferred onto the photosensitive layer, includes an illumination optical system having plural optical elements provided along an optical axis substantially perpendicular to a plane...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	NISHINAGA HISASHI
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An exposure apparatus which expose a photosensitive layer on an object with light via a mask having a pattern to be transferred onto the photosensitive layer, includes an illumination optical system having plural optical elements provided along an optical axis substantially perpendicular to a plane on which the pattern is placed, and which include an optical integrator from which the mask is illuminated with the light through a part of the plural optical elements. The apparatus also includes a filter device having a rotatable filter element provided between the optical integrator and the plane, and having a transmittance distribution in a predetermined area. Light from the optical integrator passes through a portion in the predetermined area. Light from the filter element has a variable intensity distribution different from that of the light incident on the filter element from the optical integrator, and made variable by rotating the filter element.