Method for creating derivative integrated circuit layouts for related products
A method for creating a derivative semiconductor design layout is disclosed. The method generally comprises the steps of (A) receiving a plurality of changes from a user for a first layout of a semiconductor design having a plurality of first layers, (B) storing the changes in a plurality of second...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method for creating a derivative semiconductor design layout is disclosed. The method generally comprises the steps of (A) receiving a plurality of changes from a user for a first layout of a semiconductor design having a plurality of first layers, (B) storing the changes in a plurality of second layers and (C) displaying the derivative semiconductor design layout to the user in response to logically operating on the first layers and the second layers. |
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