Method of identifying bottlenecks and improving throughput in wafer processing equipment

Throughput in a semiconductor wafer processing system, such as in-line photolithography equipment, is improved by identifying and correcting bottlenecks in the flow of wafers through multiple, associative segments of the equipment. Segmental rather than total processing times are monitored in order...

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Bibliographische Detailangaben
Hauptverfasser:	KAO TONY, CHEN STARK
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COMPUTING CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING COUNTING ELECTRIC DIGITAL DATA PROCESSING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Beschreibung
Zusammenfassung:	Throughput in a semiconductor wafer processing system, such as in-line photolithography equipment, is improved by identifying and correcting bottlenecks in the flow of wafers through multiple, associative segments of the equipment. Segmental rather than total processing times are monitored in order to identify the segments having the longest processing times. The theory of constraints is applied to identify the process segment representing a bottleneck in the process, and effect improvements in the bottleneck segment that provide greater overall throughput.