Selective refractory metal and nitride capping

A method for creating a refractory metal and refractory metal nitride cap effective for reducing copper electromigration and copper diffusion is described. The method includes depositing a refractory metal nucleation layer and nitriding at least the upper portion of the refractory metal layer to for...

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Hauptverfasser: TAYLOR NERISSA, PLANO MARY ANNE, HAVEMANN ROBERT H, FAIR JAMES A, LEE SANG-HYEOB, SUNG JUNGWAN
Format: Patent
Sprache:eng
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Zusammenfassung:A method for creating a refractory metal and refractory metal nitride cap effective for reducing copper electromigration and copper diffusion is described. The method includes depositing a refractory metal nucleation layer and nitriding at least the upper portion of the refractory metal layer to form a refractory metal nitride. Methods to reduce and clean the copper lines before refractory metal deposition are also described. Methods to form a thicker refractory metal layer using bulk deposition are also described.