Photolithographic process for extreme resolution of track width definition of a read head

A bilayer mask employed for lift off has a top strip which bridges between first and second bilayer portions and is completely undercut so that when one or more materials is sputter deposited the materials do not form fences abutting recessed edges of a bottom layer in undercuts below a top layer. S...

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Bibliographische Detailangaben
Hauptverfasser: LU JENNIFER QING, MACDONALD SCOTT ARTHUR, SANTINI HUGO ALBERTO EMILIO
Format: Patent
Sprache:eng
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Zusammenfassung:A bilayer mask employed for lift off has a top strip which bridges between first and second bilayer portions and is completely undercut so that when one or more materials is sputter deposited the materials do not form fences abutting recessed edges of a bottom layer in undercuts below a top layer. Sacrificial protective layers are formed on a sensor and lead layers for protecting these components while overlapping portions of these materials on the top of the sensor formed during deposition can be removed by ion beam sputtering, after which the sacrificial protective layers can be removed by ion milling or reactive ion etching.