Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather t...

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Bibliographische Detailangaben
Hauptverfasser:	LOOPSTRA ERIK ROELOF, BANINE VADIM YEVGENYEVICH, HAM ERIK LEONARDUS, MOORS JOHANNES HUBERTUS JOSEPHINA, DONDERS SJOERD NICOLAAS LAMBERTUS, LEENDERS MARTINUS HENDRIKUS ANTONIUS, MEILING HANS, VISSER HUGO MATTHIEU, HEERENS GERRIT-JAN, WERIJ HENRI GERARD CATO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.