Process for removing deposits from enclosed chambers

Alkaline and acid cleaning solutions (180, 182), are used sequentially for removing organic and inorganic residues, respectively, from the chamber. The two cleaning solutions are stored in separate storage containers (52, 54) carried by the cart. The alkaline cleaning fluid preferably includes a str...

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Bibliographische Detailangaben
Hauptverfasser:	DUCKETT MICHAEL A, RAYMOND ANTHONY W, KIELAR GERALD J, BLILEY JOHN C, SHAH SAYED SADIQ
Format:	Patent
Sprache:	eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DETERGENT COMPOSITIONS DETERGENTS DIFFUSION TREATMENT OF METALLIC MATERIAL DISINFECTION, STERILISATION, OR DEODORISATION OF AIR FATTY ACIDS THEREFROM HUMAN NECESSITIES HYGIENE INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES MEDICAL OR VETERINARY SCIENCE METALLURGY METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING TRANSPORTING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	Alkaline and acid cleaning solutions (180, 182), are used sequentially for removing organic and inorganic residues, respectively, from the chamber. The two cleaning solutions are stored in separate storage containers (52, 54) carried by the cart. The alkaline cleaning fluid preferably includes a strong base, such as potassium or sodium hydroxide. The acid cleaning solution includes a strong acid, such as phosphoric acid, which passivates the chamber during the cleaning process. After cleaning is complete, the two cleaning fluids are mixed together to form a neutral or near neutral solution which is disposable in a sanitary sewer system without further treatment.