Real time monitor method and system for extraction electrode

A method and apparatus for monitoring an extraction electrode utilized in the implantation of charged particles (i.e., ions) on a semiconductor wafer. A signal may be generated from an encoder associated with the extraction electrode, wherein the signal comprises data indicative of charged particles attracted to and accelerated by the extraction electrode. The signal may then be analyzed either manually or automatically to determine if the extraction electrode is located at a position appropriate to attract and accelerate the charged particles to an acceleration tube for proper implantation thereof upon the semiconductor wafer. A main controller may be linked to the extraction electrode, wherein the main controller controls a location of the extraction electrode in proximity to the charged particles.