Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device

The present invention discloses devices and a method of fabrication of devices using a shape memory effect, thin film with a compositional gradient through the thickness of the film. Specifically, a NiTi SME thin film is disclosed that can be used in actuators, MEMS devices and flow control. The pro...

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Bibliographische Detailangaben
Hauptverfasser: JARDINE PETER A, HO KEN K, CARMAN GREGORY P
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention discloses devices and a method of fabrication of devices using a shape memory effect, thin film with a compositional gradient through the thickness of the film. Specifically, a NiTi SME thin film is disclosed that can be used in actuators, MEMS devices and flow control. The process of fabrication includes a gradual heating of the target over time during the sputter deposition of a thin film on a substrate under high vacuum, without compositional modification. The resulting thin film exhibits two-way shape memory effect that can be cyclically applied without an external bias force.