High-frequency electrostatically shielded toroidal plasma and radical source

An electrostatically shielded toroidal plasma and radical source is provided. The plasma source includes a grounded metallic plasma source chamber that defines an interior for plasma generation. The plasma source chamber is configured from two L-shaped portions arranged to form rectangularly shaped...

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Hauptverfasser: TROW JOHN R, HANAWA HIROJI, STOVER DAVID, COLLINS KENNETH S, SILVEIRA FERNANDO
Format: Patent
Sprache:eng
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Zusammenfassung:An electrostatically shielded toroidal plasma and radical source is provided. The plasma source includes a grounded metallic plasma source chamber that defines an interior for plasma generation. The plasma source chamber is configured from two L-shaped portions arranged to form rectangularly shaped enclosure. Dielectric breaks are defined by gaps between the two L-shaped portions. A drive inductor is configured such that the metallic plasma source chamber is positioned between loops of the drive inductor.