Plasma reactor having an inductive antenna coupling power through a parallel plate electrode

A plasma reactor for processing a workpiece includes a reactor enclosure defining a processing chamber, a base within the chamber for supporting the workpiece during processing thereof, a semiconductor window electrode overlying the base, a gas inlet system for admitting a plasma precursor gas into...

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Bibliographische Detailangaben
Hauptverfasser: ASKARINAM ERIC, RICE MICHAEL, TROW JOHN, TSUI JOSHUA CHIU-WING, HUNG RAYMOND, COLLINS KENNETH S, BUCHBERGER DOUGLAS, GROECHEL DAVID W
Format: Patent
Sprache:eng
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Zusammenfassung:A plasma reactor for processing a workpiece includes a reactor enclosure defining a processing chamber, a base within the chamber for supporting the workpiece during processing thereof, a semiconductor window electrode overlying the base, a gas inlet system for admitting a plasma precursor gas into the chamber, an electrical terminal coupled to the semiconductor window electrode, an inductive antenna adjacent one side of the semiconductor window electrode opposite the base for coupling power into the interior of said chamber through the semiconductor window electrode.