Method of treating photoresists using electrodeless UV lamps

Methods for treating a photoresist by exposure to light from an electrodeless UV bulb are disclosed. The methods are applicable to both positive and negative photoresists. In the case of positive photoresists, use of electrodeless UV lamps significantly reduces the UV exposure time. Methods for maki...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	JONES JAMES E, CAMPBELL RANDAL L
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Methods for treating a photoresist by exposure to light from an electrodeless UV bulb are disclosed. The methods are applicable to both positive and negative photoresists. In the case of positive photoresists, use of electrodeless UV lamps significantly reduces the UV exposure time. Methods for making circuit boards and apparatus for making circuit boards are also disclosed.