Lots dispatching method for variably arranging processing equipment and/or processing conditions in a succeeding process according to the results of a preceding process and apparatus for the same

A lot dispatching method and system for variably applying the most suitable processing equipment and/or processing condition in a succeeding process of a semiconductor manufacturing process, wherein the succeeding process is influenced by the result of a preceding process. A lot processed by the pre...

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Bibliographische Detailangaben
Hauptverfasser: TONG SEUNG-HOON, KWAK DOH-SOON, KANG HEE-SE, PARK YLL-SEUG, CHO DAE-SIK, CHAE HEE-SUN, OH JAE-SEOK, KIM SEOK-HYUN, YOON TAE-YANG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A lot dispatching method and system for variably applying the most suitable processing equipment and/or processing condition in a succeeding process of a semiconductor manufacturing process, wherein the succeeding process is influenced by the result of a preceding process. A lot processed by the preceding process is dispatched to the succeeding processing equipment according to a systematic analysis result obtained from a relationship between a process result of the preceding process and an efficiency and the characteristics of a plurality of processing equipment in the succeeding process. A plurality of process conditions for the succeeding process corresponding to the performance of the preceding process is provided. A respective process condition has characteristics that minimize the difference in performance in the succeeding process from a desired or target performance. By systematically analyzing the quality of the lot waiting to be dispatched, the succeeding process is performed with the most suitable process condition.