Inspection system with enhanced contrast

An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system can utilize at least two pulse durations of light or an ultra-short pulse duration of light. The light is direct...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	LA FONTAINE BRUNO M
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system can utilize at least two pulse durations of light or an ultra-short pulse duration of light. The light is directed to the reticle and received by a detector.