Low surface tension (meth) acrylate containing block copolymer prepared by controlled radical polymerization

A block copolymer including a block of residues of a low surface tension (meth)acrylate monomer; a block of residues of a monomer free of hydroxyl group and amine group residues; and, optionally, a third block of residues of a monomer free of hydroxyl groups and amine groups. The first, second and t...

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Bibliographische Detailangaben
Hauptverfasser:	SMITH JOANNE H, GOETZ JONATHAN D, BARKAC KAREN A, SCHIMMEL KARL F, COCA SIMION, HUMBERT KURT A
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A block copolymer including a block of residues of a low surface tension (meth)acrylate monomer; a block of residues of a monomer free of hydroxyl group and amine group residues; and, optionally, a third block of residues of a monomer free of hydroxyl groups and amine groups. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2.5. A controlled radical polymerization method is disclosed to make the low surface tension block copolymers. The method includes the steps of sequentially adding a first monomer composition that is free of hydroxyl groups and amine groups and a second monomer composition that includes the low surface tension monomer to a suitable atom transfer radical polymerization initiator and polymerizing the monomer compositions to form a block copolymer.