IC die analysis via back side circuit construction with heat dissipation

Semiconductor analysis is enhanced using a system and method for improving the heat-dissipation characteristics of a semiconductor die. According to an example embodiment of the present invention, a flip-chip integrated circuit die having circuitry in a circuit side opposite a back side is formed having a back side including a thermal conductivity enhancing material. The thermal conductivity enhancing material improves the heat dissipating characteristics of the die during operation and testing and helps to reduce or prevent overheating. An epitaxial layer of silicon is formed in the back side, and circuitry is constructed in the epitaxial layer. Pre-existing circuitry on the circuit side and the newly formed circuitry in the back side are electrically coupled. The back side circuitry is operated in conjunction with the circuit side circuitry during testing and operation, and is useful, for example, for replacing defective circuitry, modifying circuit operation, and/or providing stimuli to the circuit side circuitry. The thermal conductivity enhancing material dissipates the heat generated by the circuitry and reduces the risk of a thermal related breakdown of the die. This improves the ability to analyze the die under normal and above normal operating temperatures without necessarily causing a failure in the die.