Semiconductor device manufacturing method, manufacturing system, support system and recording medium storing program of and data for the manufacture method

Semiconductor device manufacturing method for processing condition described as function of metrology process name, and performing semiconductor device measurement, generating new processing condition by linking the measurement result with the processing condition, and manufacturing the semiconducto...

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1. Verfasser: HARAKAWA SHOICHI
Format: Patent
Sprache:eng
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Zusammenfassung:Semiconductor device manufacturing method for processing condition described as function of metrology process name, and performing semiconductor device measurement, generating new processing condition by linking the measurement result with the processing condition, and manufacturing the semiconductor device itself under the new processing condition is provided. Moreover, manufacturing support system for assisting this manufacturing method, a manufacturing system for execution, and further, a recording medium wherein a program and data for executing this manufacturing method are stored are provided.