Apparatus and method for electron beam evaporation

Disclosed is an electron beam evaporator for installation in a vacuum apparatus which provides for variable positioning during or between applications of a coating. The apparatus has a carrier plate which is a flat hollow body, the top cover plate of which supports the evaporator. The hollow body is...

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Bibliographische Detailangaben
Hauptverfasser:	LOCHER STEFAN, WIRTH ECKHARD
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Disclosed is an electron beam evaporator for installation in a vacuum apparatus which provides for variable positioning during or between applications of a coating. The apparatus has a carrier plate which is a flat hollow body, the top cover plate of which supports the evaporator. The hollow body is disposed over the bore in the tank such that it can be turned about the main axis of the bore. The component assemblies of the electron beam evaporator are vacuum-tight on the cover plate and the connecting lines are carried through the interior of the hollow body to the component assemblies.