Backside heating chamber for emissivity independent thermal processes

An apparatus that includes a reflector having a mirrored surface facing down, a glass structure located beneath the reflector, a susceptor within the glass structure having a surface facing up that is capable of holding a part to be processed, and one or more radiant heat sources directed at and loc...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DUBOIS DALE R, SCUDDER LANCE A, COMITA PAUL B, SAMOILOV ARKADII V, CARLSON DAVID K, WASHINGTON LORI D, ANDERSON ROGER N
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus that includes a reflector having a mirrored surface facing down, a glass structure located beneath the reflector, a susceptor within the glass structure having a surface facing up that is capable of holding a part to be processed, and one or more radiant heat sources directed at and located beneath the glass structure.