Method for radiation projection and lens assembly for semiconductor exposure tools

A lens assembly with materials that densify and rarefy as a function of radiation dose. The lens assembly can be provided for use in photolithographic exposure tools. The combination of densifying and rarefying materials in the lens elements of exposure tools compensates for changes in the index of...

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Bibliographische Detailangaben
1. Verfasser:	BATES ALLAN KEITH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	A lens assembly with materials that densify and rarefy as a function of radiation dose. The lens assembly can be provided for use in photolithographic exposure tools. The combination of densifying and rarefying materials in the lens elements of exposure tools compensates for changes in the index of refraction of the materials. The lens assembly of the present invention corrects, by design, for radiation-induced changes in the indices of refraction of the lens element materials. By compensating for radiation-induced changes, the lens assembly has a longer useful lifetime.