Electrostatic chuck with improved temperature control and puncture resistance

Apparatus for supporting a workpiece and method of making same. The apparatus comprises a flex circuit laminated to a contoured support pedestal. The flex circuit includes a reinforced layer to improve puncture resistance of the flex circuit. The top surface of the chuck has a contoured topography t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KHOLODENKO ARNOLD, BEDI SURINDER, CLINTON JON, KATS SEMYON, SHERSTINSKY SEMYON, SHAMOUILIAN SHAMOUIL
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Apparatus for supporting a workpiece and method of making same. The apparatus comprises a flex circuit laminated to a contoured support pedestal. The flex circuit includes a reinforced layer to improve puncture resistance of the flex circuit. The top surface of the chuck has a contoured topography that is achieved by machining the upper surface of the pedestal prior to lamination of the flex circuit to the pedestal. The contoured topography improves the flow of backside cooling gas resulting in a more uniform wafer temperature profile.