Combined enhanced shock load capability and stress isolation structure for an improved performance silicon micro-machined accelerometer

The present invention provides an acceleration sensor and an accelerometer having isolation structure formed using a bulk straight wall deep reactive ion etch process, whereby external stress sources are isolated from active accelerometer components.

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LEONARDSON RONALD B, BLAKE GRAEME A
Format:	Patent
Sprache:	eng
Schlagworte:	INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT MEASURING MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK PHYSICS TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention provides an acceleration sensor and an accelerometer having isolation structure formed using a bulk straight wall deep reactive ion etch process, whereby external stress sources are isolated from active accelerometer components.