Method for producing a predetermined resist pattern

A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a...

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Bibliographische Detailangaben
Hauptverfasser:	MCCULLOUGH CHRISTOPHER DAVID, RAY KEVIN BARRY
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLOUR PRINTING ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed.