Electrostatic device for supporting wafers and other components for use at temperatures of up to 230° C

An electrostatic chuck for clamping an electrically conducting workpiece includes an electrode that is incorporated between two insulating layers of an organic material, preferably polyimide, and that is mounted, with or without a coating, on a metallic pedestal. An insulating intermediate layer, fo...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BUSSE KARL-HERMANN, ARIT JOACHIM
Format: Patent
Sprache:eng
Schlagworte:
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