Wafer rack provided with a gas distribution device

Wafer rack consisting of a carrier frame provided with accommodations for at least two wafers. To provide uniform distribution of gas over said wafers a gas distribution device is fitted at least above each wafer, which gas distribution device is connected to the gas supply for the reactor in which...

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Bibliographische Detailangaben
1. Verfasser:	BEULENS SJAAK JACOBUS JOHANNES
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Wafer rack consisting of a carrier frame provided with accommodations for at least two wafers. To provide uniform distribution of gas over said wafers a gas distribution device is fitted at least above each wafer, which gas distribution device is connected to the gas supply for the reactor in which the wafer rack is placed. Connection to such a gas supply can be via coupling of the wafer rack to a part of said reactor.