Impurity measuring device

A first solution is brought into contact with a surface of a sample so that impurities, which exist in the sample or on the surface of the sample, and the sample are dissolved in the first solution, and a voltage is applied across electrodes by putting the electrodes into the first solution so that...

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Bibliographische Detailangaben
Hauptverfasser: SASAKI YUMI, TAMAOKI MAKIKO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A first solution is brought into contact with a surface of a sample so that impurities, which exist in the sample or on the surface of the sample, and the sample are dissolved in the first solution, and a voltage is applied across electrodes by putting the electrodes into the first solution so that substances including the impurities are deposited on the surface of the electrodes, and the deposited impurities are dissolved in a second solution so that impurities dissolved in the second solution are measured. As a result, an impurity measuring method and an impurity measuring device, which are capable of measuring a very small amount of impurities with high sensitivity, which exist in the sample or on the surface of the sample, are provided.