Method of manufacturing a semiconductor device having conductive patterns

A method of manufacturing a semiconductor device having a fuse conductive pattern is disclosed. The method includes forming a fuse conductive pattern on a silicon substrate and forming a first insulation layer on the fuse conductive pattern and the silicon substrate. The first insulation layer has a...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KONISHI MAMORU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!