Method for removing contaminants from integrated circuits

A method for removing contaminants from integrated circuit devices. Particularly disclosed is a method for removing alkali metal and halogen-based contaminants from an integrated circuit device as the device is being fabricated.

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Bibliographische Detailangaben
Hauptverfasser:	OBENG, YAW SAMUEL
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A method for removing contaminants from integrated circuit devices. Particularly disclosed is a method for removing alkali metal and halogen-based contaminants from an integrated circuit device as the device is being fabricated.