Process for large area deposition of diamond-like carbon films

A new method for ion beam deposition of diamond-like carbon coatings onto a variety of substrates is described. A high power, radio frequency excited-inductively coupled ion gun directs a beam of carbon and hydrogen ions at a substrate inside an ultra vacuum deposition chamber. A four axis scanner i...

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Bibliographische Detailangaben
Hauptverfasser:	BLETZINGER, PETER, WU, RICHARD L.C, LANTER, WILLIAM C
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A new method for ion beam deposition of diamond-like carbon coatings onto a variety of substrates is described. A high power, radio frequency excited-inductively coupled ion gun directs a beam of carbon and hydrogen ions at a substrate inside an ultra vacuum deposition chamber. A four axis scanner is used for coating large and nonplaner substrates. A quadrupole mass spectrometer is mounted inside the deposition chamber for real time monitoring of ion composition. The disclosed method is particularly effective for coating zinc sulfide and zinc selenide infrared windows.