Gas discharge device

PCT No. PCT/KR97/00225 Sec. 371 Date Jun. 7, 1999 Sec. 102(e) Date Jun. 7, 1999 PCT Filed Nov. 18, 1997 PCT Pub. No. WO98/22969 PCT Pub. Date May 28, 1998The invention relates to a plasma technique, and can be used for generation of beams of charged particles, for instance, ions, in technological go...

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Hauptverfasser:	ALEXANDROV, ANDREJ FEDOROVICH, KRALKINA, ELENA ALEXANDROVNA, RUKHADZE, ANRI AMVROSIEVICH, KONDRANIN, SERGEY GENNADIEVICH, ANTONOVA, TATIJANA BORISOVNA, BOUGROV, GLEB ELMIROVICH, PAVLOV, VLADIMIR BORISOVICH
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MACHINES OR ENGINES FOR LIQUIDS MECHANICAL ENGINEERING OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR PLASMA TECHNIQUE PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDEDFOR PRODUCING MECHANICAL POWER PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS WEAPONS WIND, SPRING WEIGHT AND MISCELLANEOUS MOTORS
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Zusammenfassung:	PCT No. PCT/KR97/00225 Sec. 371 Date Jun. 7, 1999 Sec. 102(e) Date Jun. 7, 1999 PCT Filed Nov. 18, 1997 PCT Pub. No. WO98/22969 PCT Pub. Date May 28, 1998The invention relates to a plasma technique, and can be used for generation of beams of charged particles, for instance, ions, in technological goals and in the space electric propulsion installations. Gas discharge device comprises an axially symmetric chamber with at least one face wall, a HF power input unit and a magnetic system providing the generation of stationary non-uniform magnetic field inside the chamber. The induction of magnetic field decreases not only in the radial direction towards the chamber axis of symmetry but also in the longitudinal direction towards the face part of the chamber opposite to the area of HF power input unit arrangement. The invention is characterized in that the HF power input unit is fabricated as conductor of zigzag recurrent symmetric shape and is located on the lateral and face walls of the chamber comprising the region of plasma generation and in that the horizontal size of the chamber exceeds its longitudinal size.