Film composition and method for a planar surface atop a plated through hole

The present invention relates to a method for planarizing circuit board apertures wherein a photoimageable film composition comprising a photoimageable dielectric composition and a support film is employed to fill the circuit board apertures. Precircuitized and postcircuitized embodiments are discus...

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Bibliographische Detailangaben
Hauptverfasser: FLETCHER, MARY BETH, PAPATHOMAS, KONSTANTINOS I, NEDBALSKI, ROBERT L, RAI, AMARJIT SINGH
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a method for planarizing circuit board apertures wherein a photoimageable film composition comprising a photoimageable dielectric composition and a support film is employed to fill the circuit board apertures. Precircuitized and postcircuitized embodiments are discussed.