Process of manufacturing a cobalt-chromium orthopaedic implant without covering defects in the surface of the implant

An orthopaedic implant is forged from a metallic body consisting of a cobalt-chromium alloy. The forged implant is descaled by blasting the implant with a particulate blasting agent at a momentum which is sufficient to remove scale formed on the implant during the forging step but insufficient to ot...

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Bibliographische Detailangaben
Hauptverfasser:	HUMPHREY, STEVEN M, REED, ROBIN J, BLAKEMORE, DAVID M, KITCH, STEVEN C, MERCHANT, KRIS K, BENDER, LARRY S, GILBERTSON, LESLIE N, COMPTON, RICHARD C, CWIK, RICHARD B, MOSHER, TIM A
Format:	Patent
Sprache:	eng
Schlagworte:	ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL BANDAGES, DRESSINGS OR ABSORBENT PADS DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF,TUBULAR STRUCTURES OF THE BODY, E.G. STENTS FILTERS IMPLANTABLE INTO BLOOD VESSELS FIRST-AID KITS FOMENTATION GRINDING HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES PERFORMING OPERATIONS POLISHING PROSTHESES TRANSPORTING TREATMENT OR PROTECTION OF EYES OR EARS
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Beschreibung
Zusammenfassung:	An orthopaedic implant is forged from a metallic body consisting of a cobalt-chromium alloy. The forged implant is descaled by blasting the implant with a particulate blasting agent at a momentum which is sufficient to remove scale formed on the implant during the forging step but insufficient to otherwise cause major structural surface deformation to the implant. The descaled implant is electro-chemical polished by submersing the implant in an acid bath having a temperature of between approximately 80 DEG F. and 90 DEG F. The acid bath includes approximately 45% sulfuric acid and 50% phosphoric acid. Direct current electrical power ranging between approximately 10 volts D.C. and 13 volts D.C. is applied to the implant. The polished implant is ultrasonically cleaned. The implant is inspected with a fluorescent penetrant to determine whether surface defects exist in the implant.