Apparatus and method for inline removal of impurities from wet chemicals
An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the housing is positioned in-line with a wet chemical recirculation line, transfill system or distribution system. |
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