Etching of silicon nitride

Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.

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Bibliographische Detailangaben
Hauptverfasser:	POPE, KEITH R, MADDEN, KAREN P, RATH, DAVID L, JAGANNATHAN, RANGARAJAN, MCCULLOUGH, KENNETH J, OKORN-SCHMIDT, HARALD F
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.