Micromachined devices having microbridge structure
A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbr...
Gespeichert in:
Hauptverfasser: | , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | PARSONS ANDREW D NICKLIN RALPH SHORROCKS NICHOLAS M WALKER MARTIN J |
description | A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbridge having a uniform thickness. The planarising layer may be a sacrificial layer or may comprise a sacrificial layer as well as other layers. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US5942791A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US5942791A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US5942791A3</originalsourceid><addsrcrecordid>eNrjZDDyzUwuys9NTM7IzEtNUUhJLctMTi1WyEgsy8xLV8gFSSYVZaakpyoUlxSVJpeUFqXyMLCmJeYUp_JCaW4GeTfXEGcP3dSC_PjU4oLE5NS81JL40GBTSxMjc0tDR2PCKgBjUSwY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Micromachined devices having microbridge structure</title><source>esp@cenet</source><creator>PARSONS; ANDREW D ; NICKLIN; RALPH ; SHORROCKS; NICHOLAS M ; WALKER; MARTIN J</creator><creatorcontrib>PARSONS; ANDREW D ; NICKLIN; RALPH ; SHORROCKS; NICHOLAS M ; WALKER; MARTIN J</creatorcontrib><description>A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbridge having a uniform thickness. The planarising layer may be a sacrificial layer or may comprise a sacrificial layer as well as other layers.</description><edition>6</edition><language>eng</language><subject>ELECTRICITY</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990824&DB=EPODOC&CC=US&NR=5942791A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990824&DB=EPODOC&CC=US&NR=5942791A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PARSONS; ANDREW D</creatorcontrib><creatorcontrib>NICKLIN; RALPH</creatorcontrib><creatorcontrib>SHORROCKS; NICHOLAS M</creatorcontrib><creatorcontrib>WALKER; MARTIN J</creatorcontrib><title>Micromachined devices having microbridge structure</title><description>A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbridge having a uniform thickness. The planarising layer may be a sacrificial layer or may comprise a sacrificial layer as well as other layers.</description><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDyzUwuys9NTM7IzEtNUUhJLctMTi1WyEgsy8xLV8gFSSYVZaakpyoUlxSVJpeUFqXyMLCmJeYUp_JCaW4GeTfXEGcP3dSC_PjU4oLE5NS81JL40GBTSxMjc0tDR2PCKgBjUSwY</recordid><startdate>19990824</startdate><enddate>19990824</enddate><creator>PARSONS; ANDREW D</creator><creator>NICKLIN; RALPH</creator><creator>SHORROCKS; NICHOLAS M</creator><creator>WALKER; MARTIN J</creator><scope>EVB</scope></search><sort><creationdate>19990824</creationdate><title>Micromachined devices having microbridge structure</title><author>PARSONS; ANDREW D ; NICKLIN; RALPH ; SHORROCKS; NICHOLAS M ; WALKER; MARTIN J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5942791A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>PARSONS; ANDREW D</creatorcontrib><creatorcontrib>NICKLIN; RALPH</creatorcontrib><creatorcontrib>SHORROCKS; NICHOLAS M</creatorcontrib><creatorcontrib>WALKER; MARTIN J</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PARSONS; ANDREW D</au><au>NICKLIN; RALPH</au><au>SHORROCKS; NICHOLAS M</au><au>WALKER; MARTIN J</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Micromachined devices having microbridge structure</title><date>1999-08-24</date><risdate>1999</risdate><abstract>A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbridge having a uniform thickness. The planarising layer may be a sacrificial layer or may comprise a sacrificial layer as well as other layers.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US5942791A |
source | esp@cenet |
subjects | ELECTRICITY |
title | Micromachined devices having microbridge structure |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T00%3A18%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PARSONS;%20ANDREW%20D&rft.date=1999-08-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS5942791A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |